Name of the Equipment | Laser Doping System |
Group | |
Category | clean |
Operator | |
System Owner | Guru Burkul guruburkul@iitb.ac.in |
| Make / Model | Scantech Laser Pvt. Ltd. |
| Information | No |
| Serial Number | NA |
| FootPrint | 1 m X 1.5 m |
| InstallationDate | 04/01/2012 |
| Equipment Type | Miscellaneous |
| Location | NCPRE Char lab (3rd Floor, NanoE Building) |
| AMC | Required |
| Local Dealer | Anant Deshpande Anant Deshpande, TTC Industrial Area, MIDC, Mahape, Navi Mumbai, anant@laserscience.in, 022-4155-3232 |
| Actual Dealer | Laser Science Services (I) Pvt. Ltd. Anant Deshpande, TTC Industrial Area, MIDC, Mahape, Navi Mumbai, anant@laserscience.in, 022-4155-3232 |
| SOP | SOP/59_SOP.pdf |
| Training & other policy documents | POLICY/59_POLICY.pdf |
| Recipies | RECEPIES/59_RECEPIES.pdf |
| Glimpse | GLIMPSE/59_GLIMPSE.pdf |
| Tool Facilities Requirements | N2 |
| Access | Open |
| Lab Phone No | 3585 |
| Substrate allowed | Silicon |
| Substrate Dimension | Maximum 4 inch |
| Chemical allowed | NA, c-Si, mc-Si, SiN, SiO2, Glass |
| Precursors/ Targets available *Based on stock availability | NA |
| Precursor/ Target loaded inside tool | 4 |
| Target dimension | NA |
| Gases allowed | PN2 |
| Contamination remarks | High power density involved, material should withstand high laser power, sample should not produce fumes hazards, only c-silicon material based samples without any metals are allowed at this point but metal containing samples can be consulted |