Name of the Equipment | RCA Wet Bench |
Group | |
Category | clean pv |
Operator | |
System Owner | Ajin Raphy ajinraphy@iitb.ac.in |
| Make / Model | Laxmi Instruments |
| Information | No |
| Serial Number | NA |
| FootPrint | NA |
| InstallationDate | |
| Equipment Type | Wet chemistry tools |
| Location | NCPRE Fab lab (2nd Floor, NanoE Building) |
| AMC | Required |
| Local Dealer | NA NA |
| Actual Dealer | NA NA |
| SOP | SOP/65_SOP.pdf |
| Training & other policy documents | POLICY/65_POLICY.pdf |
| Recipies | RECEPIES/65_RECEPIES.pdf |
| Glimpse | GLIMPSE/65_GLIMPSE.pdf |
| Tool Facilities Requirements | DIW |
| Access | Open |
| Lab Phone No | 3583 |
| Substrate allowed | Si |
| Substrate Dimension | Minimum: 2 inch and Maximum: 5 Inch x 5 Inch |
| Chemical allowed | NH4OH,HCL,H2O2,HF, Bare Si wafers and processed samples with Si as starting wafer |
| Precursors/ Targets available *Based on stock availability | NA |
| Precursor/ Target loaded inside tool | 4 |
| Target dimension | NA |
| Gases allowed | NA |
| Contamination remarks | Clean |