Equipment Details


Name of the Equipment2 inch Boron diffusion
GroupCrystalline Silicon Solar Cells
Categoryclean pv
Operator
System OwnerJayshree Bhajipale
164076018@iitb.ac.in

Make / ModelUrjas Tube Furnace - 3 STF
InformationNo
Serial NumberNA
FootPrint
InstallationDate06/29/2015
Equipment TypeDeposition, Growth and Annealing systems
LocationNCPRE Fab lab (2nd Floor, NanoE Building)
AMC Required
Local DealerUrjas Energy Solutions

Urjas Energy Solutions www.urjas.com Tel:+91 022 28620267 Pradeep Kumar Podal : 9870999679 Devendra Pareek : 8879180221
Actual DealerUrjas Energy Solutions

Urjas Energy Solutions www.urjas.com Tel: +91 022 28620267
SOP SOP/110_SOP.pdf
Training & other policy documents
Recipies
Glimpse
Tool Facilities Requirements
AccessOpen
Lab Phone No4489 Ext Flash 1
Substrate allowedSi
Substrate Dimension2 inch Maximum, Quarter of 2 inch Minimum
Chemical allowedBoron Dopant Paste, Si
Precursors/ Targets available
*Based on stock availability
NA
Precursor/ Target loaded inside tool4
Target dimensionNA
Gases allowedN2, O2
Contamination remarksRCA cleaned wafers are only allowed. The furnace is used for diffusion of screen printed boron dopant paste.