Equipment Details


Name of the Equipment2 inch Annealing Furnace
GroupCrystalline Silicon Solar Cells
Categorysemi-clean pv
OperatorJayshree Bhajipale
System OwnerJayshree Bhajipale
164076018@iitb.ac.in

Make / ModelUrjas Furnace
InformationNo
Serial NumberNA
FootPrint
InstallationDate06/25/2015
Equipment TypeDeposition, Growth and Annealing systems
LocationNCPRE Fab lab (2nd Floor, NanoE Building)
AMC Not Required
Local DealerUrjas Energy Solutions

Urjas Energy Solutions www.urjas.com Tel:+91 022 28620267 Pradeep Kumar Podal : 9870999679 Devendra Pareek : 8879180221
Actual DealerUrjas Energy Solutions

Urjas Energy Solutions www.urjas.com Tel: +91 022 28620267
SOP SOP/46_SOP.pdf
Training & other policy documents
Recipies
Glimpse GLIMPSE/46_GLIMPSE.pdf
Tool Facilities RequirementsNA
AccessOpen
Lab Phone No4489 Ext Flash 1
Substrate allowedOnly Spray coated (Al2O3, SiO2) samples allowed
Substrate Dimension2 inch Maximum, Quarter of 2 inch Minimum
Chemical allowedNA, Si, Al2O3
Precursors/ Targets available
*Based on stock availability
NA
Precursor/ Target loaded inside tool4
Target dimensionNA
Gases allowedN2, O2, 5% FG
Contamination remarksRCA cleaned wafers are only allowed. The furnace is used for only Spray coated (Al2O3, SiO2) samples.