Name of the Equipment | Electrochemical Capacitance Voltage (ECV) Dopant Profiler |
Group | Crystalline Silicon Solar Cells |
Category | semi-clean pv |
Operator | |
System Owner | Ajin Raphy ajinraphy@iitb.ac.in |
| Make / Model | WEP Control- CVP21 |
| Information | No |
| Serial Number | NA |
| FootPrint | ~ 60 cm x 70 cm |
| InstallationDate | 06/14/2017 |
| Equipment Type | Material and structural characterization tools |
| Location | NCPRE Fab lab (2nd Floor, NanoE Building) |
| AMC | Not Required |
| Local Dealer | Anarghya Innovations and Technology Pvt. Ltd. Anarghya Innovations and Technology Pvt. Ltd., # 32 (New), 7th 'A' Main Road, Muthyalanagar, Mathikere, Bangalore - 560 054, India. Tel: +91-80-23376488. info@anarghyainnotech.com |
| Actual Dealer | WEP Control WEP Bregstr. 90 Furtwangen, Germany 78120 info@wepcontrol.com Phone +49-7723-9197-0 Fax +49-7723-9197-22 |
| SOP | SOP/107_SOP.pdf |
| Training & other policy documents | |
| Recipies | |
| Glimpse | GLIMPSE/107_GLIMPSE.pdf |
| Tool Facilities Requirements | CDA |
| Access | Controlled |
| Lab Phone No | 3583 |
| Substrate allowed | Phosphorus / Boron Diffused Si samples |
| Substrate Dimension | Preferably more than 2 cm x 2 cm |
| Chemical allowed | NA, Need to present the process flow in the NCPRE Si group meeting to get permission for process requests. |
| Precursors/ Targets available *Based on stock availability | NA |
| Precursor/ Target loaded inside tool | 1 |
| Target dimension | NA |
| Gases allowed | NA |
| Contamination remarks | Destructive Method ! Samples may be Na or K contaminated. |