Name of the Equipment | Plasma Enhanced Chemical Vapor Deposition (PECVD) |
Group | Crystalline Silicon Solar Cells |
Category | semi-clean pv |
Operator | |
System Owner | Ajin Raphy ajinraphy@iitb.ac.in |
| Make / Model | Oxford Instruments/ Plasmalab System 100 |
| Information | No |
| Serial Number | 815456 |
| FootPrint | 2.0 m x 1m |
| InstallationDate | 10/21/2013 |
| Equipment Type | Deposition, Growth and Annealing systems |
| Location | NCPRE Fab lab (2nd Floor, NanoE Building) |
| AMC | Required |
| Local Dealer | Oxford India Gurupal Singh, Oxford Instruments India. |
| Actual Dealer | Oxford Instruments Michael.STOKELEY@oxinst.com |
| SOP | SOP/62_SOP.pdf |
| Training & other policy documents | POLICY/62_POLICY.pdf |
| Recipies | RECEPIES/62_RECEPIES.pdf |
| Glimpse | GLIMPSE/62_GLIMPSE.pdf |
| Tool Facilities Requirements | SiH4, NH3, N2, Ar, He, H2, N2O,Water |
| Access | Open |
| Lab Phone No | 3583 |
| Substrate allowed | Si, Quartz |
| Substrate Dimension | Pieces to 8 inch wafers |
| Chemical allowed | NA, Si, SiN, SiO2, borosilicate glass |
| Precursors/ Targets available *Based on stock availability | NA |
| Precursor/ Target loaded inside tool | 4 |
| Target dimension | NA |
| Gases allowed | SiH4, NH3, N2, Ar, He, H2, N2O |
| Contamination remarks | Any other sample beyond the mentioned list needs due contamination clearance |