The high-efficiency silicon solar cell architectures like selective emitter, bifacial, and interdigitated back contact necessitate the formatuon of single-sided and patterned diffused regions. We at NCPRE, study the feasibility of extending the application of screen printing, a facility which is already been used for metallization, for junction formation. The characterization results of screen-printed phosphorus dopant paste diffusion have been benchmarked against conventionally used phosphorus oxychloride based diffusion. 18.3 % efficient aluminium back surface field solar cell fabricated on 23 cm2 area wafers, makes the screen-printed dopant paste diffusion approach promising as a cost-effective and less complicated alternative.
