The fabrication and characterization of black silicon is currently a hot topic in PV research community due to its highly desirable light-trapping properties. The research team at NCPRE has developed a low-cost, high throughput metal-assisted chemical etch process based black silicon technology, applicable for both single and multi-crystalline silicon wafers. The black silicon fabrication process consists of three cost-effective chemical processes which use silver nitrate and other PV grade chemicals. The black silicon surfaces consist of fine porous nano-textures capable of minimizing the light reflection losses especially at UV and near IR regions compared to conventionally textured single and multi-crystalline silicon wafers. An impressive overall reflectance of 3% without any ARC coating indicates the potential of black silicon technology to emerge as the next generation cost-effective texturing scheme for silicon solar cells.